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Products > Vacuum Coater > Vacuum Coating Machine (Arc Vaporization)

Vacuum Coating Machine (Arc Vaporization)

Y&J is a well-respected name in the vacuum coating industry. The basic idea behind the mid-frequency pulsed magnetron sputtering is fairly simple, which is to use a magnetic field and a pulsed power source to improve target ionization degree and deposition rate. The target is the source of material desired to be deposited on the substrate. Ionization of the target is a process by which atoms in the target are energized and directed towards the substrate where they form a thin film.

Y&J is a well-respected name in the vacuum coating industry. The basic idea behind the mid-frequency pulsed magnetron sputtering is fairly simple, which is to use a magnetic field and a pulsed power source to improve target ionization degree and deposition rate. The target is the source of material desired to be deposited on the substrate. Ionization of the target is a process by which atoms in the target are energized and directed towards the substrate where they form a thin film.
The cathode may be any of metals, including copper, titanium, nickel, and chromium. In some cases, the free metal ions react with the ionized gas (i.e. nitrogen) contained in the plasma environment to form a metal compound for coating, such as titanium nitride, titanium carbide, and zirconium nitride. Arc vaporization uses a cathode as the source of deposition. Therefore, the process is also known as cathodic arc vaporization, or cathodic arc plasma deposition. Highlighted on this page is the vacuum coating machine that can conduct the arc vaporization process and has found wide use in metatallizing watches, door locks, crockery, kitchenware, eyeglass frames, luminaire, bathroom fixtures and more. As a specialized vacuum coating machine provider, we can customize your vacuum coater or vacuum metallizer to suit your specific coating requirements. Medium frequency pulsed magnetron sputtering is a physical vapor deposition process that combines pulsed power technology, magnetron sputtering deposition, and arc evaporation into one operation. This PVD technology improves coating performance and allows metals, metal compounds and multi-layer films to be deposited on the surface of various metal and non-metal tools and parts. With years of dedicated experience in the research and development of vacuum coating technology, our team of technicians uses cathodic arc sources to supply free ions, and an unbalanced magnetic field to confine the plasma to an area near the target but not reaching the target. Advanced computer system maintains overall, automatic control of the system. The resulting film of coating is dense, sticks tightly to the substrate, and has uniform thickness across the substrate surface.

Applications of Vacuum Coating Machine

Coats metals, metal compounds or other materials onto watches, cellphone cases, metal hardware, sanitary ware, kitchenware, and wear-resistance tools, molds and dies.

Material to Be Deposited

This vacuum coating machine is quite a multi-tasker, as it applies Tin, TiCN, CrN, TiALN, TiCrN, ZrN, or TiNC to the substrate surface.

Colors of Coating

BITE vacuum coater can create a variety of colors, including black, rainbow (5 colors), rose gold, among other colors.

Features of Vacuum Coating Machine

1. Magnetron sputtering technology utilizes a magnetic field that extends from the target material to near the substrate surface. As the target atoms are energized, they are directed towards the substrate under the magnetic force. A high degree of target ionization can be achieved, along with an exquisite powder coating and excellent surface finish.
2. Cathodic arc plasma deposition generates a stable plasma using an optimized cathode that operates with 30A electric current. The coating layer bonds tightly to the substrate partly due to the atomic diffusion process.

Technical Specifications of Vacuum Coating Machine

Model LKBT-900 LKBT-1100 LKBT-1250 LKBT-1350
Vacuum Chamber Size ф900×1000 ф1100×1200 ф1250×1100 ф1350×1100
Vacuum Pump Speed 1×105 Pa~3×10-3 Pa≤20min
Maximum Vacuum Level ≤1×10-3 Pa
Auxiliary Equipment 2x-15 /2x-70 /ZJP-300 /KT-600
Options
F-400/3600 molecular pump
2x-15 /2x-70 /ZJP-300 /KT-630
Options
F-400/3600 molecular pump
2x-15 /2x-70 /ZJP-300 /KT-630
Options F-400/3600 molecular pump
2x-15 /2x-70 /ZJP-300 /KT-630
Options
F-400/3600 molecular pump
Transmission Planetary Gear (number of shafts: 8-16, as per customer requirements)
Heating Method Heating tubes are on mounted to the side of the vacuum chamber
Ion Bombardment Pulse voltage: 0-1000V (available with a voltage converter)
Gas Supply Automatic glow control valve ensures a steady supply of gas into the vacuum chamber.
No. of Cathodic Arcs 6 arcs 6-8 arcs 8-10 arcs 8-12 arcs
Magnetically Controlled Targets 1-2
(Flat or cylindrical targets are available.)
2-4
(Flat or cylindrical targets are available.)
2-8
(Flat or cylindrical targets are available.)
2-8
(Flat or cylindrical targets are available.)
Working Method Semi-automatic PLC or fully automatic PC+PLC
Gas Environment Ar , N2, O2, C2H2
Total Power 40KW 45-60KW 60-80KW 70-90KW
Compressed Air Pressure 0.4~0.8MPa
Water Cooling System Water pressure/temperature: ≤25 ℃ /≥0.25MPa (Currently unavailable)